The Journal of Science and Engineering Applications (JSEA)

Abstract

In this study, thin films of pure and doped (Nio) nickel oxide  doped with indium  (3% and 5%) were deposited on glass substrates at a temperature of about  400 °C by spray pyrolysis method.. X-ray diffraction (XRD) and energy-dispersive X-ray spectroscopy (EDX) were used to study the structural properties of the samples. The results indicate that the growth of the films occurs in the preferred orientation of the (111) plane, and no peak suggesting the presence of indium was observed in the samples. Morphological analysis of the samples was performed using atomic force microscopy (AFM), which showed that surface roughness increases with higher doping levels. Additionally, field emission scanning electron microscopy (FESEM) analysis was conducted to further elucidate the structural and crystalline properties